The Japan Society of Applied Physics

[N-8-3] Effect of Annealing on the Vertical Structural Distribution of Solution-Processed a-Si:H Films

Y. Sakuma1, K. Ohdaira1,2, T. Masuda1,3, H. Takagishi1,2, Z. Shen1,2, T. Shimoda1,2,3 (1.JAIST, 2.JST-ALCA, 3.JST-ERATO (Japan))

https://doi.org/10.7567/SSDM.2013.N-8-3