[P-3-2] Fabrication of Aluminum Oxide Thin Films by Solution-Source Non-Vacuum Process of Mist Chemical Vapor Deposition with Ozone Assistance

T. Uchida¹, T. Kawaharamura², M. Furuta², S. Fujita³ (1.Kyoto Univ. Department of Electronic Sci. and Eng., 2.Kochi Univ. of Tech. Inst. for Nanotechnorogy, 3.Kyoto Univ. Photonics and Electronics Sci. and Eng. Center (Japan))

https://doi.org/10.7567/SSDM.2013.P-3-2