The Japan Society of Applied Physics

[PS-1-14L] Residual Defects in Low-dose Arsenic Implanted Si after High-temperature Rapid Thermal Annealing: Their Behavior and Influence on CCD Image Sensors

A. Sagara1, A. Uedono2, N. Oshima3, R. Suzuki3, S. Shibata1 (1.Panasonic Corp., 2.Univ. of Tsukuba, 3.National Inst. of Advanced Indus. Sci. and Tech. (Japan))

https://doi.org/10.7567/SSDM.2013.PS-1-14L