[PS-13-21L] Fabrication of graphene devices using resist-free process

M. Nakamura¹、Y. Ohno¹、K. Maehashi¹、K. Inoue¹、K. Matsumoto¹ (1.ISIR, Osaka Univ. (Japan))

https://doi.org/10.7567/SSDM.2013.PS-13-21L