[PS-14-10] Suppressing Al Memory-Effect on CVD growth of 4H-SiC Epilayers by adding Hydrogen Chloride Gas

S. Ji¹, K. Kojima¹, Y. Ishida¹, S. Saito¹, S. Yoshida¹, H. Tsuchida², H. Okumura¹ (1.AIST, 2.Central Res. Inst. of Electric Power Industry (Japan))

https://doi.org/10.7567/SSDM.2013.PS-14-10