[PS-14-10] Suppressing Al Memory-Effect on CVD growth of 4H-SiC Epilayers by adding Hydrogen Chloride Gas

S. Ji¹、K. Kojima¹、Y. Ishida¹、S. Saito¹、S. Yoshida¹、H. Tsuchida²、H. Okumura¹ (1.AIST、2.Central Res. Inst. of Electric Power Industry (Japan))

https://doi.org/10.7567/SSDM.2013.PS-14-10