[PS-14-11] As and Al Activation in SiC Wafer by Atmospheric Thermal Plasma Jet Annealing

H. Hanafusa¹、R. Ashihara¹、K. Maruyama¹、S. Koyanagi¹、S. Hayashi¹、H. Murakami¹、S. Higashi¹ (1.Hiroshima Univ. (Japan))

https://doi.org/10.7567/SSDM.2013.PS-14-11