[PS-14-11] As and Al Activation in SiC Wafer by Atmospheric Thermal Plasma Jet Annealing
H. Hanafusa1, R. Ashihara1, K. Maruyama1, S. Koyanagi1, S. Hayashi1, H. Murakami1, S. Higashi1
(1.Hiroshima Univ. (Japan))
https://doi.org/10.7567/SSDM.2013.PS-14-11