Fabrication and Characterization of BaSi<sub>2</sub> Epitaxial Films over 1.5 μm on Si(111)

R. Takabe; K. Nakamura; M. Baba; W. Du; M.A. Khan; K. Toko; M. Sasase; K. Hara; N. Usami; T. Suemasu

doi:https://doi.org/10.7567/SSDM.2013.PS-15-16

[PS-15-16] Fabrication and Characterization of BaSi₂ Epitaxial Films over 1.5 μm on Si(111)

R. Takabe¹, K. Nakamura¹, M. Baba¹, W. Du¹, M.A. Khan¹, K. Toko¹, M. Sasase², K. Hara³, N. Usami^3,4, T. Suemasu^1,4 (1.Univ. of Tsukuba, 2.The Wakasa Wan Energy Research Center, 3.Nagoya Univ., 4.JST-CREST (Japan))

https://doi.org/10.7567/SSDM.2013.PS-15-16

2013 International Conference on Solid State Devices and Materials

[PS-15-16] Fabrication and Characterization of BaSi2 Epitaxial Films over 1.5 μm on Si(111)

[PS-15-16] Fabrication and Characterization of BaSi₂ Epitaxial Films over 1.5 μm on Si(111)