The Japan Society of Applied Physics

[PS-15-16] Fabrication and Characterization of BaSi2 Epitaxial Films over 1.5 μm on Si(111)

R. Takabe1、K. Nakamura1、M. Baba1、W. Du1、M.A. Khan1、K. Toko1、M. Sasase2、K. Hara3、N. Usami3,4、T. Suemasu1,4 (1.Univ. of Tsukuba、2.The Wakasa Wan Energy Research Center、3.Nagoya Univ.、4.JST-CREST (Japan))

https://doi.org/10.7567/SSDM.2013.PS-15-16