[PS-15-17] Direct Formation of Polycrystalline BaSi₂ Films on Glass Substrate by RF Sputtering

N.A.A. Latiff¹、T. Yoneyama¹、T. Shibutami²、K. Matsumaru²、K. Toko¹、T. Suemasu^1,3 (1.Univ. of Tsukuba、2.Tosoh Corp.、3.JST-CREST (Japan))

https://doi.org/10.7567/SSDM.2013.PS-15-17