[PS-3-3] Effects of HfO2 and Lanthanum Capping Layer Thickness on the Narrow Width Behavior of Gate First High-K and Metal Gate NMOS Transistors
S.S. Naresh1, N.R. Mohapatra1, P.K. Duhan2
(1.IIT-Gandhinagar, 2.IIT-Bombay (India))
https://doi.org/10.7567/SSDM.2013.PS-3-3