[PS-6-11] Wet cleaning process for GaN Surface at room temperature

Y. Tsuji^1,2、T. Katsuyama¹、A. Teramoto²、Y. Shirai²、S. Sugawa²、T. Ohmi² (1.Sumitomo Electric Industries, Ltd.、2.Tohoku Univ. (Japan))

https://doi.org/10.7567/SSDM.2013.PS-6-11