[PS-8-19] Synthesis of MAX-Phase Containing Ti-Si-C Films by Sputter-Deposition Using Elemental Targets

T. Sonoda¹、S. Nakao¹、M. Ikeyama¹ (1.National Inst. of Advanced Indus. Sci. and Tech. (AIST) (Japan))

https://doi.org/10.7567/SSDM.2013.PS-8-19