[C-9-1] Deposition of Thin Si, Ge, and SiGe Films by Ballistic Hot Electron Reduction

M. Yagi¹、R. Suda¹、A. Kojima¹、R. Mentek¹、N. Mori²、J. Shirakashi¹、N. Koshida¹ (1.Tokyo Univ. of Agri. & Tech.、2.Osaka Univ. (Japan))

https://doi.org/10.7567/SSDM.2014.C-9-1