The Japan Society of Applied Physics

[C-9-1] Deposition of Thin Si, Ge, and SiGe Films by Ballistic Hot Electron Reduction

M. Yagi1, R. Suda1, A. Kojima1, R. Mentek1, N. Mori2, J. Shirakashi1, N. Koshida1 (1.Tokyo Univ. of Agri. & Tech., 2.Osaka Univ. (Japan))

https://doi.org/10.7567/SSDM.2014.C-9-1