[F-7-3] Origin of Self-limiting Oxidation of Ge in High-Pressure O₂ at Low Temperature

C.H. Lee^1,2, T. Nishimura^1,2, K. Nagashio^1,2, A. Toriumi^1,2 (1.Univ. of Tokyo, 2.JST-CREST (Japan))

https://doi.org/10.7567/SSDM.2014.F-7-3