11:00 〜 11:15
[C-7-2] Investigation of Interface State Density and Fixed Charge of SrxSiOx+2 on the 2×1 Sr-reconstructed Si Substrate
○S. Taniwaki1, Y. Hotta1,3, H. Yoshida1,3, K. Arafune1,3, A. Ogura2,3, S. Satoh1,3
(1.Univ. of Hyogo, 2.Meiji Univ., 3.JST-CREST(Japan))
https://doi.org/10.7567/SSDM.2015.C-7-2