12:00 PM - 12:15 PM

[C-7-6] Activation of Silicon Implanted with Phosphorus and Boron Atoms by Microwave Rapid Annealing

^○S. Kimura¹, M. Hasumi¹, K. Ota¹, T. Sameshima¹ (1.Tokyo Univ. of Agri. & Tech.(Japan))

https://doi.org/10.7567/SSDM.2015.C-7-6