17:05 〜 17:20

[D-2-4] Tolerance to UV-O₃ Exposure of CVD and Mechanically Exfoliated MoS₂ & Fabrication of Top-Gated CVD MoS₂ FETs

^○S. Kurabayashi¹, K. Nagashio^1,2 (1.Univ. of Tokyo, 2.JST-PRESTO(Japan))

https://doi.org/10.7567/SSDM.2015.D-2-4