The Japan Society of Applied Physics

15:15 〜 15:30

[E-1-5] Intercalation Doping with Metal Chlorides in Low-Temperature-Grown Multilayer CVD Graphene for Interconnect Applications

H. Miyazaki1,2, R. Matsumoto3, M. Katagiri1,2, D. Nishide1,4, R. Ifuku1,4, M. Takahashi1, Y. Yamazaki1,2, T. Matsumoto1,4, N. Sakuma1,2, K. Ueno5, T. Sakai1,2, A. Kajita1,2 (1.LEAP, 2.Toshiba Corp., 3.Tokyo Polytechnic Univ., 4.Tokyo Electron Ltd., 5.Shibaura Inst. of Tech.(Japan))

https://doi.org/10.7567/SSDM.2015.E-1-5