10:10 〜 10:30

[K-3-4] Assessment of GIDL Reduction and Vth Modulation with Plasma Doped FinFETs

^○J. M. Lee^1,2, K. H. Cho², H. J. Bae², D. W. Kim², S. Paak², I. Chung¹ (1.Sungkyunkwan Univ., 2.Samsung Electronics Co. Ltd(Korea))

https://doi.org/10.7567/SSDM.2015.K-3-4