12:00 〜 12:15

[M-7-5] The Effects of AlN Passivation Layer to Metal Work-Function and Band Alignment of Metal Oxide Semiconductor Devices

^○H. B. Do¹, Q. H. Luc¹, M. T. H. Ha¹, S. H. Huynh¹, Y. C. Lin¹, E. Y. Chang¹ (1.National Chiao Tung Univ.(Taiwan))

https://doi.org/10.7567/SSDM.2015.M-7-5