10:10 AM - 10:30 AM [N-3-4] Comprehensive Understanding of SiO2-IL Scavenging in HfO2/SiO2/Si Stack X. Li1, T. Yajima1, T. Nishimura1, ○A. Toriumi1 (1.Univ. of Tokyo(Japan)) https://doi.org/10.7567/SSDM.2015.N-3-4