10:10 〜 10:30

[N-3-4] Comprehensive Understanding of SiO₂-IL Scavenging in HfO₂/SiO₂/Si Stack

X. Li¹, T. Yajima¹, T. Nishimura¹, ^○A. Toriumi¹ (1.Univ. of Tokyo(Japan))

https://doi.org/10.7567/SSDM.2015.N-3-4