16:05 〜 16:35

[O-2-1] (Invited) Scaling and Optimization of Ferroelectric Hafnium Oxide for Memory Applications and Beyond

^○J. Müller, P. Polakowski, S. Riedel (1.Fraunhofer IPMS-CNT(Germany))

https://doi.org/10.7567/SSDM.2015.O-2-1