16:35 〜 16:55

[O-2-2] Effect of Stress on Ferroelectricity of (Hf_0.5Zr_0.5)O₂ Thin Films

^○H. Funakubo^1,, T. Shiraishi¹, T. Shimizu¹, T. Yokouchi¹, T. Oikawa¹, H. Uchida² (1.Tokyo Tech, 2.Sophia Univ.(Japan))

https://doi.org/10.7567/SSDM.2015.O-2-2