17:35 〜 17:55

[O-2-5] Formation of Ge Oxide Film by Neutral Beam Post Oxidation using Al Metal Film

^○T. Ohno^1,2, D. Nakayama³, S. Samukawa^1,3 (1.WPI-AIMR, Tohoku Univ., 2.JST-PRESTO, 3.IFS, Tohoku Univ.(Japan))

https://doi.org/10.7567/SSDM.2015.O-2-5