9:30 AM - 9:50 AM [O-3-2] Microstructural Change in Cu/WOx/TiN during Resistive Switching ○M. Arita1, A. Takahashi1, Y. Ohno1, A. Nakane1, A. Tsurumaki Fukuchi1, Y. Takahashi1 (1.Hokkaido Univ.(Japan)) https://doi.org/10.7567/SSDM.2015.O-3-2