09:30 〜 09:50

[O-3-2] Microstructural Change in Cu/WO_x/TiN during Resistive Switching

^○M. Arita¹, A. Takahashi¹, Y. Ohno¹, A. Nakane¹, A. Tsurumaki Fukuchi¹, Y. Takahashi¹ (1.Hokkaido Univ.(Japan))

https://doi.org/10.7567/SSDM.2015.O-3-2