[PS-1-8] UV Raman and Multiwavelength Photoluminescence Characterization of Ion Implanted Silicon for In-Line Dopant Activation Process Monitoring Applications

^○W. S. Yoo¹, T. Ishigaki¹, T. Ueda¹, K. Kang¹, N. Hasuike², H. Harima², M. Yoshimoto² (1.WaferMasters, Inc., 2.Kyoto Inst. of Tech.(USA))

https://doi.org/10.7567/SSDM.2015.PS-1-8