The Japan Society of Applied Physics

[PS-1-8] UV Raman and Multiwavelength Photoluminescence Characterization of Ion Implanted Silicon for In-Line Dopant Activation Process Monitoring Applications

W. S. Yoo1, T. Ishigaki1, T. Ueda1, K. Kang1, N. Hasuike2, H. Harima2, M. Yoshimoto2 (1.WaferMasters, Inc., 2.Kyoto Inst. of Tech.(USA))

https://doi.org/10.7567/SSDM.2015.PS-1-8