[PS-2-9] Capacitance Characteristics of Low-k Low-Cost CVD Grown Polyimide Liner for High-Density Cu-TSVs in 3D-LSI

^○M. Mariappan¹, J. C. Bea¹, T. Fukushima¹, H. Hashimoto¹, K. W. Lee¹, M. Koyanagi¹ (1.Tohoku Univ.(Japan))

https://doi.org/10.7567/SSDM.2015.PS-2-9