[PS-6-4] Thermal Stability of the Interface between Atomic Layer Deposited High-k ZrO₂ and GaN

^○H. Wang^1,2, G. Ye¹, K. S. Ang² (1.Nanyang Technological Univ., 2.Temasek Laboratories@NTU(Singapore))

https://doi.org/10.7567/SSDM.2015.PS-6-4