The Japan Society of Applied Physics

[PS-8-28L] Chemical Vapor Deposition of Highly Resistive ZnO Films using Nonequilibrium N2/O2 Plasma Generated near Atmospheric Pressure

Y. Nose1, T. Kiguchi1, T. Yoshimura1, A. Ashida1, T. Uehara2, N. Fujimura1 (1.Osaka Prefecture Univ., 2.Sekisui Chemical Co., LTD.(Japan))

https://doi.org/10.7567/SSDM.2015.PS-8-28L