[PS-8-28L] Chemical Vapor Deposition of Highly Resistive ZnO Films using Nonequilibrium N₂/O₂ Plasma Generated near Atmospheric Pressure

^○Y. Nose¹, T. Kiguchi¹, T. Yoshimura¹, A. Ashida¹, T. Uehara², N. Fujimura¹ (1.Osaka Prefecture Univ., 2.Sekisui Chemical Co., LTD.(Japan))

https://doi.org/10.7567/SSDM.2015.PS-8-28L