Characterization of Epitaxial Calcium Fluoride as a Dielectric Material for Ultra-thin Barrier Layers in Silicon Microelectronics

Y. Y. Illarionov

doi:https://doi.org/10.7567/SSDM.2015.PS-9-3

[PS-9-3] Characterization of Epitaxial Calcium Fluoride as a Dielectric Material for Ultra-thin Barrier Layers in Silicon Microelectronics

^○Y. Y. Illarionov^1,2, M. I. Vexler², V. V. Fedorov², S. M. Suturin², N. S. Sokolov², T. Grasser¹ (1.TU Wien, 2.Ioffe Physical-Technical Inst.(Austria))

https://doi.org/10.7567/SSDM.2015.PS-9-3

2015 International Conference on Solid State Devices and Materials

[PS-9-3] Characterization of Epitaxial Calcium Fluoride as a Dielectric Material for Ultra-thin Barrier Layers in Silicon Microelectronics