[PS-9-8] Gate-Stacking Engineering for Insta Ge/SiO₂/SiGe MOS Devices

^○P. H. Liao¹, W. T. Lai², S. C. Luo¹, K. C. Yang¹, T. George¹, P. W. Li² (1.National Central Univ., 2.National Chiao Tung Univ.(Taiwan))

https://doi.org/10.7567/SSDM.2015.PS-9-8