Chemical Vapor Deposition of Highly Resistive ZnO Films using Nonequilibrium N<sub>2</sub>/O<sub>2</sub> Plasma Generated near Atmospheric Pressure

2015 International Conference on Solid State Devices and Materials

Sep 27, 2015 - Sep 30, 2015
Sapporo Convention Center, Sapporo, Japan

^○Y. Nose¹, T. Kiguchi¹, T. Yoshimura¹, A. Ashida¹, T. Uehara², N. Fujimura¹ (1.Osaka Prefecture Univ., 2.Sekisui Chemical Co., LTD.(Japan))