The Japan Society of Applied Physics

[E-1-5] Intercalation Doping with Metal Chlorides in Low-Temperature-Grown Multilayer CVD Graphene for Interconnect Applications

H. Miyazaki1,2, R. Matsumoto3, M. Katagiri1,2, D. Nishide1,4, R. Ifuku1,4, M. Takahashi1, Y. Yamazaki1,2, T. Matsumoto1,4, N. Sakuma1,2, K. Ueno5, T. Sakai1,2, A. Kajita1,2 (1.LEAP, 2.Toshiba Corp., 3.Tokyo Polytechnic Univ., 4.Tokyo Electron Ltd., 5.Shibaura Inst. of Tech.(Japan))

2015 International Conference on Solid State Devices and Materials |Mon. Sep 28, 2015 3:15 PM - 3:30 PM |PDF Download

[E-1-6] Doped Carbon Nanotubes for Interconnects

J. Robertson1, S. Esconjauregui1, L. D'Arsie1, J. Yang1, H. Sugime1, G. Zhong1, S. Vollebregt2, R. Ishihara2, C. Cepek3, G. Duesberg4, T. Hallam4, Y. Guo1 (1.Univ. of Cambridge, 2.Delft Univ., 3.TASC, 4.Trinity College Dublin(UK))

2015 International Conference on Solid State Devices and Materials |Mon. Sep 28, 2015 3:30 PM - 3:45 PM |PDF Download