Study about the Ion Beam Etching (IBE) Process for the High Density Spintronic Devices and its Damage Recovery by the Oxygen Showering Post-treatment (OSP)

3:55 PM - 4:15 PM

[B-2-02] Study about the Ion Beam Etching (IBE) Process for the High Density Spintronic Devices and its Damage Recovery by the Oxygen Showering Post-treatment (OSP)

^○J. Jeong^1,2, T. Endoh^1,3,4 (1.Tohoku Univ.(Japan), 2.Samsung Electronics Co. Ltd(Korea), 3.CIES, Tohoku Univ.(Japan), 4.JST-ACCEL(Japan))