The Japan Society of Applied Physics

2:30 PM - 2:45 PM

[E-4-04] H-terminated Diamond Field Effect Transistor with Ferroelectric Gate Insulator

R. Karaya1, Y. Mori1, H. Furuichi1, I. Baba1, T. Nakajima2, N. Tokuda1,T. Kawae1 (1.Kanazawa Univ.(Japan), 2.Tokyo Univ. of Science(Japan))

https://doi.org/10.7567/SSDM.2016.E-4-04