Evaluation of SiO<sub>x</sub>/Si and SiN<sub>x</sub>/Si Interfaces using Laser Terahertz Emission Microscope

A. Ito

doi:https://doi.org/10.7567/SSDM.2016.J-4-03

2:15 PM - 2:30 PM

[J-4-03] Evaluation of SiO_x/Si and SiN_x/Si Interfaces using Laser Terahertz Emission Microscope

^○A. Ito¹, T. Mochizuki², Y. Takase¹, H. Nakanishi¹, J. Mitchell², K. Tanahashi², I. Kawayama³, M. Tonouchi³, K. Shirasawa², H. Takato² (1.SCREEN Holdings Co., Ltd.(Japan), 2.AIST(Japan), 3.Osaka Univ.(Japan))

https://doi.org/10.7567/SSDM.2016.J-4-03

2016 International Conference on Solid State Devices and Materials

[J-4-03] Evaluation of SiOx/Si and SiNx/Si Interfaces using Laser Terahertz Emission Microscope

[J-4-03] Evaluation of SiO_x/Si and SiN_x/Si Interfaces using Laser Terahertz Emission Microscope