MoCl<sub>5</sub> Intercalation Doping and Oxygen Passivation of Submicrometer-Sized Multilayer Graphene

H. Miyazaki

doi:https://doi.org/10.7567/SSDM.2016.K-4-03

2016 International Conference on Solid State Devices and Materials

2016年9月26日〜 2016年9月29日
Tsukuba International Congress Center, Tsukuba, Japan

14:20 〜 14:40

[K-4-03] MoCl₅ Intercalation Doping and Oxygen Passivation of Submicrometer-Sized Multilayer Graphene

^○H. Miyazaki¹, R. Matsumoto², M. Katagiri¹, K. Ueno³, T. Sakai¹, A. Kajita¹ (1.Toshiba Corp.(Japan), 2.Tokyo Polytechnic Univ.(Japan), 3.Shibaura Inst. of Tech.(Japan))

https://doi.org/10.7567/SSDM.2016.K-4-03

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2016 International Conference on Solid State Devices and Materials

[K-4-03] MoCl5 Intercalation Doping and Oxygen Passivation of Submicrometer-Sized Multilayer Graphene

[K-4-03] MoCl₅ Intercalation Doping and Oxygen Passivation of Submicrometer-Sized Multilayer Graphene