13:50 〜 14:10

[O-4-02] Evaluation of Potential Change and Electrical Dipole in HfO₂/SiO₂/Si Structure

^○N. Fujimura¹, A. Ohta¹, K. Makihara¹, S. Miyazaki¹ (1.Nagoya Univ.(Japan))

https://doi.org/10.7567/SSDM.2016.O-4-02