High-Mobility and Low-Carrier-Density Sputtered-MoS<sub>2</sub> Film by Low-Temperature Forming-Gas Annealing for 3D-IC

2016 International Conference on Solid State Devices and Materials

Sep 26, 2016 - Sep 29, 2016
Tsukuba International Congress Center, Tsukuba, Japan

3:00 PM - 5:00 PM

^○J. Shimizu¹, T. Ohashi¹, K. Matsuura¹, I. Muneta¹, K. Kakushima¹, K. Tsutsui¹, H. Wakabayashi¹ (1.Tokyo Tech(Japan))