Centimeter-scale High-performance Few-layer MoS<sub>2</sub> Fabricated by RF Magnetron Sputtering and Subsequent Post-deposition Annealing

S. Ishihara

2016 International Conference on Solid State Devices and Materials

2016年9月26日〜 2016年9月29日
Tsukuba International Congress Center, Tsukuba, Japan

11:15 〜 11:18

[PS-13-06] Centimeter-scale High-performance Few-layer MoS₂ Fabricated by RF Magnetron Sputtering and Subsequent Post-deposition Annealing

^○S. Ishihara^1,3, Y. Hibino¹, N. Sawamoto¹, T. Ohashi², K. Matsuura², H. Wakabayashi², A. Ogura¹ (1.Meiji Univ.(Japan), 2.Tokyo Tech(Japan), 3.Research Fellow of JSPS(Japan))

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2016 International Conference on Solid State Devices and Materials

[PS-13-06] Centimeter-scale High-performance Few-layer MoS2 Fabricated by RF Magnetron Sputtering and Subsequent Post-deposition Annealing

[PS-13-06] Centimeter-scale High-performance Few-layer MoS₂ Fabricated by RF Magnetron Sputtering and Subsequent Post-deposition Annealing