15:00 〜 17:00 [PS-14-09] Oxidation Mechanism of 4H-SiC in Dilute N2O Ambient T. H. Wu1,○B. Y. Tsui1, Y. H. Tseng1, C. T. Yeng2, C. C. Hung2, C. Y. Lee2 (1.NCTU(Taiwan), 2.Hestia-Power Inc.(Taiwan)) https://doi.org/10.7567/SSDM.2016.PS-14-09