11:15 AM - 11:18 AM [PS-4-06] SiCOH Low-k material based RRAM for BEOL Process Compatible Nonvolatile Memory Application ○L. Zheng1, Y. Dai1, L. Yu1, L. Chen1, Q. Sun1, S. Ding1, W. Zhang1 (1.Fudan Univ.(China))