3:00 PM - 5:00 PM [PS-9-12(Late News)] Gate-stack Engineering of Self-organized Nanospherical Ge-gate/SiO2/Si1-xGex-channel on Si (100) and Si (110) for Ge MOS Devices P. H. Liao1, C. W. Tien2, K. P. Peng2, H. C. Lin2, T. George1,○P. W. Li1,2 (1.National Central Univ.(Taiwan), 2.NCTU(Taiwan)) https://doi.org/10.7567/SSDM.2016.PS-9-12L
